Fabrication of three-dimensional photonics crystals by interference lithography with low light absorption
Y.V. Miklyaev, S.V. Karpeev, P.N. Dyachenko, V.S. Pavelyev, S.D. Poletaev
South-Ural State University, Dept. of Optics and Spectroscopy,
S. P. Korolev Samara State Aerospace Univercity ,
Image Processing Systems Institute RAS
Full text of article: Russian language.
Polymer templates of photonic crystals are fabricated by means of interference lithography. Gratings are recorded in SU-8 photoresist by He-Cd laser radiation at 442 nm wavelength. Radiation with this wavelength corresponds to low absorption in photoresist. This allow us to get homogenious illumination in depth of the photomaterial. Optimal parameters of exposition and photoresist processing are defined for fabrication of porous structures. The produced structures have orthorhombic symmetryd.
photonic crystal, interference lithography, He-Cd laser, photoresist SU-8.
Citation: Miklyaev YuV, Karpeev SV, DyachenkoPN, PavelyevVS, PoletaevSD. Fabrication of three-dimensional photonics crystals by interference lithography with low light absorption. Computer Optics 2008; 32(4): 357-60.
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